The influence of oxygen on the optical properties of RF-sputtered zinc oxide thin films

Superlattices and Microstructures

Volumn 42, Issue 1-6, 2007, Pages 85-88

  Gioffre M ^a,b   Angeloni, M ^a   Gagliardi, M ^a   Iodice, M ^a   Coppola, G ^a   Aruta, C ^c   Della Corte, F G ^b  

^a CNR   (Italy)

^b UNIVERSITY MEDITERRANEA OF REGGIO CALABRIA   (Italy)

^c UNIVERSITY OF ROME TOR VERGATA   (Italy)

Author keywords

Optical characterization; Sputtering; Zinc oxide

Indexed keywords

MAGNETRON SPUTTERING; PARTIAL PRESSURE; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

DEPOSITION CHAMBERS; LINEAR VARIATIONS; OXYGEN FLUX;

OXYGEN;

EID: 34548478597     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2007.04.048     Document Type: Article

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