Poly-benzyl domains grown on porous silicon and their I-V rectification

Applied Surface Science

Volumn 253, Issue 23, 2007, Pages 9130-9136

  Chao, Jie ^a   Han, Huan Mei ^a   Xia, Bing ^a   Ba, Long ^b   Liu, Hong Bo ^a   Xiao, Shou Jun ^a  

^a NANJING UNIVERSITY   (China)

^b SOUTHEAST UNIVERSITY   (China)

Author keywords

I V rectification; Poly benzyl domain; Porous silicon

Indexed keywords

ALKYLATION; ATOMIC FORCE MICROSCOPY; FRIEDEL-CRAFTS REACTION; MICROWAVE IRRADIATION; POLYMERIC MEMBRANES; POLYMERIZATION; POROUS SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

I-V RECTIFICATION; MICROWAVE IRRADIATED POLYMERIZATION; POLY-BENZYL DOMAIN;

AROMATIC POLYMERS;

EID: 34548245646     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.05.044     Document Type: Article

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