Thermal stability of electrical characteristics of nickel silicide metal gate

Wuli Xuebao/Acta Physica Sinica

Volumn 56, Issue 8, 2007, Pages 4943-4949

  Shan, Xiao Nan ^a   Huang, Ru ^a   Li, Yan ^a   Cai, Yi Mao ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

Furnace annealing; Metal gate; NiSi; Rapid thermal annealing

Indexed keywords

EID: 34548169124     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)