Structural phase control of CdSe thin films by metalorganic chemical vapor deposition

Journal of Crystal Growth

Volumn 307, Issue 1, 2007, Pages 26-29

  Ju, Z G ^a,b   Lu, Y M ^a   Zhang, J Y ^a   Wu, X J ^a,b   Liu, K W ^a,b   Zhao, D X ^a   Zhang, Z Z ^a   Li, B H ^a   Yao, B ^a   Shen, D Z ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

A1. Phase transition; A1. Photoluminescence; A1. X ray diffraction; A3. Metalorganic chemical vapor deposition; B1. CdSe

Indexed keywords

FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHASE CONTROL; PHASE TRANSITIONS; PHOTOLUMINESCENCE; SEMICONDUCTING CADMIUM COMPOUNDS; X RAY DIFFRACTION;

CRYSTALLINE PHASES; EMISSION PEAKS;

THIN FILMS;

EID: 34548166307     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.06.006     Document Type: Article

References (22)

1. Waldau R.J., Stûcheli N., Braun M., Steiner M.L., Bucher E., Tenne R., Flaisher H., Kerfin W., Braun R., and Koschel W. J. Appl. Phys. 64 (1988) 2601
2. Matsumura N., Endo H., and Saraie J. Phys. Stat. Sol. B 229 (2002) 1039
3. Frese Jr. K.W. Appl. Phys. Lett. 40 (1982) 275
4. Hermandez C.F., Suh D.J., Kippelen B., and Marder S.R. Appl. Phys. Lett. 85 (2004) 534
5. Uthana S., and Reddy P.J. Phys. Stat. Sol. A 65 (1981) 269
6. Klude M., Passow T., Heinke H., and Hommel D. Phys. Stat. Sol. B 229 (2002) 1029
7. Henry C.H., Nassau K., and Shiever J. Phys. Rev. B 4 (1971) 2453
8. Halsted R.E., and Aven M. Phys. Rev. Lett. 14 (1965) 64
9. Jäger-Waldau R., Stücheli N., Braun M., Lux Steiner M., and Bucher E. J. Appl. Phys. 64 (1988) 2601
10. Nair M.T.S., and Nair P.K. J. Appl. Phys. 74 (1993) 1879
11. Lehmann A.G., Bionducci M., and Buffa F. Phys. Rev. B 58 (1998) 5275
12. Shan C.X., Liu Z., Ng C.M., and Hark S.K. Appl. Phys. Lett. 86 (2005) 213106
13. Lunz U., Kuhn J., Goschenhofer F., Schussler U., Einfeldt S., Becker C.R., and Landwehr G. J. Appl. Phys. 80 (1996) 6861
14. Sliberstein R.P., and Tomkiewica M. J. Appl. Phys. 54 (1983) 5428
15. Abay B., Efeoglu H., Yogurtçu Y.K., and Alieva M. Semicond. Sci. Technol. 16 (2001) 745
16. Langer D.W., Park Y.S., and Euwema R.N. Phys. Rev. 152 (1966) 788
17. Arakawa Y., and Sasaki H. Appl. Phys. Lett. 40 (1982) 939
18. Henry C.H., Nassau K., and Shiever J.W. Phys. Rev. B 4 (1971) 2453
19. Samarth N., Luo H., and Furdyna J.K. Appl. Phys. Lett. 54 (1989) 2680
20. Tenne R., Jäger-Waldau R., Lux-Steiner M., Bucher E., Rioux J., and Levy-Clement C. Phys. Rev. B 42 (1990) 1763
21. Calzadilla O., Zapata-Torres M., and Narváez L. Superficies y Vacio 14 (2002) 35
22. Kale R.B., and Lokhande C.D. J. Phys. Chem. B 109 (2005) 20288