Effect of post-annealing on the magnetic properties of Bi:YIG film by RF magnetron sputtering on Si substrates

IEEE Transactions on Magnetics

Volumn 43, Issue 9, 2007, Pages 3652-3655

  Yang, Qinghui ^a   Huaiwu, Zhang ^a   Yingli, Liu ^a   Qiye, Wen ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Bi:YIG film; Coercive force; Recurrent rapid thermal annealing; RF magnetron sputtering; Saturation magnetization

Indexed keywords

BISMUTH COMPOUNDS; COERCIVE FORCE; MAGNETIC FILMS; MAGNETRON SPUTTERING; RAPID THERMAL ANNEALING; SATURATION MAGNETIZATION; SILICON; SUBSTRATES;

RECURRENT RAPID THERMAL ANNEALING; RF MAGNETRON SPUTTERING;

AMORPHOUS MATERIALS;

EID: 34548075750     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2007.900979     Document Type: Article

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