Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light

Jinshu Xuebao/Acta Metallurgica Sinica

Volumn 43, Issue 7, 2007, Pages 764-768

  Leng, Wenhua ^a   Liu, Dongpo ^a   Cheng, Xiaofang ^a   Zhu, Wencai ^a,b   Zhang, Jianqing ^a,c   Cao, Chunan ^a,c  

^a ZHEJIANG UNIVERSITY   (China)

^b Shandong Institute of Education   (China)

^c INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Copper; Electrodeposition; Photoelectrochemical anticorrosion; Visible light; WO3

Indexed keywords

CHEMICAL ANALYSIS; COPPER; ELECTRODEPOSITION; PHOTOCURRENTS;

PHOTOELECTROCHEMICAL ANTICORROSION; VISIBLE LIGHT;

ELECTROCHEMICAL ELECTRODES;

EID: 34547963166     PISSN: 04121961     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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