Characterization of wavelength stability of dispersive monolithic double channel-cut monochromator in order of 10-9

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 A, 2006, Pages 7933-7937

  Zhang, Xiaowei ^a   Fujimoto, Hiroyuki ^b  

^a HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

High resolution measurement; Monolithic double channel cut monochromator; Synchrotron radiation

Indexed keywords

BANDWIDTH; SILICON; SINGLE CRYSTALS; SPECTRUM ANALYSIS; SYNCHROTRON RADIATION; X RAY ANALYSIS;

FLOAT ZONE SILICON CRYSTALS; HIGH RESOLUTION MEASUREMENT; MONOLITHIC DOUBLE CHANNEL-CUT MONOCHROMATORS;

MONOCHROMATORS;

EID: 34547909642     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7933     Document Type: Article

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