Nonpolar (1120) p-type nitrogen-doped ZnO by remote-plasma-enhanced metalorganic chemical vapor deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 20-24, 2007, Pages

  Gangil, Sandip ^a   Nakamura, Atsushi ^a   Shimomura, Masaru ^a   Temmyo, Jiro ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Nitrogen doping; Remote plasma enhanced metalorganlc chemical vapor deposition; X ray photoelectron spectroscopy

Indexed keywords

BONDING; CRYSTAL ORIENTATION; FILM GROWTH; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DOPING;

NITROGEN DOPING; REMOTE-PLASMA-ENHANCED METALORGANLC CHEMICAL VAPOR DEPOSITION; WEAK COMPLEXES;

ZINC OXIDE;

EID: 34547850401     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L549     Document Type: Article

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