Implantation-induced nonequilibrium reaction between Zn ions of 60 keV and Si O2 target

Applied Physics Letters

Volumn 91, Issue 6, 2007, Pages

  Amekura, H ^a   Yoshitake, M ^a   Plaksin, O A ^a,c   Kishimoto, N ^a   Buchal, Ch ^b   Mantl, S ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c INSTITUTE OF PHYSICS AND POWER ENGINEERING   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRIC EXCITATION; FUSED SILICA; THERMODYNAMICS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC COMPOUNDS;

ATHERMAL ENERGY; METALLIC PHASES; NONEQUILIBRIUM REACTION; X RAY EXCITED AUGER ELECTRON SPECTROSCOPY;

ION IMPLANTATION;

EID: 34547842553     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2768004     Document Type: Article

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