The instability of a-Si:H TFT under mechanical strain with high frequency ac bias stress

Electrochemical and Solid-State Letters

Volumn 10, Issue 10, 2007, Pages

  Wang, M C ^a   Chang, T C ^b,d   Liu, Po Tsun ^c   Tsao, S W ^b   Lin, Y P ^b   Chen, J R ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

SILICON COMPOUNDS; STABILITY; STRAIN; THRESHOLD VOLTAGE;

BIAS STRESS; TENSILE BIAS STRESS; TENSILE SITUATION;

THIN FILM TRANSISTORS;

EID: 34547828157     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2756294     Document Type: Article

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