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Volumn 20, Issue 3, 2007, Pages 201-207

Yield learning and process optimization on 65-nm CMOS technology accelerated by the use of short flow test die

Author keywords

Design for manufacturability (DFM); Short flow test die; Yield optimization; Yield ramp

Indexed keywords

DIELECTRIC PROPERTIES; MICROPROCESSOR CHIPS; OPTIMIZATION; PROCESS CONTROL; SHORT CIRCUIT CURRENTS;

EID: 34547813593     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.901825     Document Type: Conference Paper
Times cited : (4)

References (12)
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  • 2
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  • 5
    • 21244431635 scopus 로고    scopus 로고
    • Infrastructure for successful BEOL yield ramp, transfer to manufacturing, and DFM characterization at 65 nm. and below
    • May-Jun
    • G. Yeric, E. Cohen, J. Garcia, K. Davis, E. Salem, and G. Green, "Infrastructure for successful BEOL yield ramp, transfer to manufacturing, and DFM characterization at 65 nm. and below," IEEE Design Test Comput., vol. 22, no. 3, pp. 232-239, May-Jun. 2005.
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  • 6
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    • Measurement of contact resistance distribution using a 4K-contacts array
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  • 7
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    • Fast extraction of killer defect density and size distribution using a single layer short flow NEST structure
    • Monterey, CA, Mar
    • C. Hess, D. Stashower, B. E. Stine, G. Verma, and L. H. Weiland, "Fast extraction of killer defect density and size distribution using a single layer short flow NEST structure," in Proc. ICMTS, Monterey, CA, Mar. 2000, pp. 57-62.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.