메뉴 건너뛰기




Volumn 515, Issue 22, 2007, Pages 8197-8200

Growth of β-FeSi2 thin films on β-FeSi2 (110) substrates by molecular beam epitaxy

Author keywords

FeSi2; AFM; Etching; Homoepitaxy; Molecular beam epitaxy; RHEED

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; FILM GROWTH; FILM PREPARATION; IRON COMPOUNDS; MOLECULAR BEAM EPITAXY; SURFACE ROUGHNESS;

EID: 34547794100     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.040     Document Type: Article
Times cited : (8)

References (12)
  • 11
  • 12
    • 34547761706 scopus 로고    scopus 로고
    • G = 660 °C.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.