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Volumn 515, Issue 22, 2007, Pages 8197-8200
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Growth of β-FeSi2 thin films on β-FeSi2 (110) substrates by molecular beam epitaxy
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Author keywords
FeSi2; AFM; Etching; Homoepitaxy; Molecular beam epitaxy; RHEED
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ETCHING;
FILM GROWTH;
FILM PREPARATION;
IRON COMPOUNDS;
MOLECULAR BEAM EPITAXY;
SURFACE ROUGHNESS;
HOMOEPITAXY;
THIN FILMS;
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EID: 34547794100
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2007.02.040 Document Type: Article |
Times cited : (8)
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References (12)
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