Titanium diboride thin films by low-temperature chemical vapor deposition from the single source precursor Ti(BH 4) 3(1,2- dimethoxyethane)

Chemistry of Materials

Volumn 19, Issue 15, 2007, Pages 3802-3807

  Kumar, Navneet ^a   Yang, Yu ^a   Noh, Wontae ^a,b   Girolami, Gregory S ^a,b   Abelson, John R ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HALOGEN FREE SINGLE SOURCE PRECURSORS; MEAN SQUARE ROUGHNESS; TITANIUM DIBORIDE;

CHEMICAL VAPOR DEPOSITION; CORROSION RESISTANCE; ELECTRIC CONDUCTIVITY; HALOGEN COMPOUNDS; LOW TEMPERATURE EFFECTS; THIN FILMS;

TITANIUM COMPOUNDS;

EID: 34547696939     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm070277z     Document Type: Article

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