Electrical properties of pressure quenched silicon by thermal spraying

Thin Solid Films

Volumn 515, Issue 20-21, 2007, Pages 7744-7750

  Tan, S Y ^a,b   Gambino, R J ^b   Sampath, S ^b   Herman, H ^b  

^a CHINESE CULTURE UNIVERSITY   (Taiwan)

^b Stony Brook University   (United States)

Author keywords

Electrical properties; Metastable phase silicon; Plasma spray; Polycrystalline silicon; Semiconductor

Indexed keywords

CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; HIGH PRESSURE EFFECTS; PLASMA SPRAYING; QUENCHING; SEMICONDUCTOR MATERIALS; SINGLE CRYSTALS; X RAY DIFFRACTION;

METASTABLE PHASE SILICON;

POLYSILICON;

EID: 34547696865     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.152     Document Type: Article

References (17)

1. Duclos J., Vohra Y.K., and Ruoff A.L. Phys. Rev. Lett. 58 (1987) 775
2. McMahon M.I., and Nelmes R.J. Phys. Rev. B 47 (1993) 8337
3. Wentorf R.H., and Kasper J.S. Science 139 (1963) 338
4. Zhao Y.X., Buehler F., Sites J.R., and Spain I.L. Solid State Commun. 59 (1986) 679
5. Herman H., Sampath S., and McCune R. MRS Bull. 25 (2000) 17
6. Sampath S., Herman H., Patel A., Gambino R., Greenlaw R., and Toney E. Materials Development for Direct Write Technologies, San Francisco, U.S.A., April 24-26, 2000. Materials Research Society Symposium Proceeding vol. 624 (2000) 181
7. Tan S.Y., Gambino R.J., Goswami R., Sampath S., and Herman H. Materials Development for Direct Write Technologies, San Francisco, U.S.A., April 24-26, 2000. Materials Research Society Symposium Proceeding vol. 624 (2000) 189
8. Dickey H.C., and Meek T.T. The Second International Symposium on Applied Plasma Science, Osaka, Japan, September 20-24, 1999. Vacuum vol. 59 (2000) 179
9. Goswami R., Parise J.B., Sampath S., and Herman H. J. Mater. Res. 14 (1999) 3489
10. Iwai H., Ohguro T., and Ohmi S.-I. Microelectron. Eng. 60 (2002) 157
11. Van der Pauw L.J. Philips Res. Rep. 13 (1958) 1
12. Blood P., and Orton J.W. The Electrical Characterization of Semiconductors: Majority Carriers and Electron States (1992), Academic Press, London 109
13. Besson J.M., Mokhtari E.H., Gonzalez J., and Weill G. Phys. Rev. Lett. 59 (1987) 473
14. Seto J.Y.W. J. Appl. Phys. 46 (1975) 5247
15. Akani M., Suryanarayanan R., and Brun G. Thin Solid Films 151 (1987) 343
16. Sze S.M. Physics of Semiconductor Devices (1981), Wiley, New York 280
17. Cullity B.D. Elements of X-ray Diffraction (1978), Assison-Wesley, London 13