Quantitative surface analysis of Fe-Ni alloy films by XPS, AES and SIMS

Surface and Interface Analysis

Volumn 39, Issue 8, 2007, Pages 665-673

  Kim, K J ^a   Moon, D W ^a   Park, C J ^a   Simons, D ^b   Gillen, G ^b   Jin, H ^c,d   Kang, H J ^c  

^a Korea Research Institute of Standards and Science   (South Korea)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c Chungbuk National University   (South Korea)

^d HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

C60 sims; Fe Ni alloy; ICP MS; Isotope dilution method; Surface quantification

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ISOTOPES; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; SURFACE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALLOY FILMS; CONSULTATIVE COMMITTEE FOR AMOUNT OF SUBSTANCE (CCQM); ISOTOPE DILUTION METHODS; SURFACE QUANTIFICATION;

IRON ALLOYS;

EID: 34547676160     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2575     Document Type: Article

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