Top-down and bottom-up through-thickness current anisotropy in a bilayer YBa 2Cu 3O 7-x film

Applied Physics Letters

Volumn 91, Issue 5, 2007, Pages

  Chen, Z J ^a,d   Feldmann, D M ^a,b   Larbalestier, D C ^a,d   Holesinger, T G ^b   Li, X ^c   Zhang, W ^c   Rupich, M W ^c  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c AMERICAN SUPERCONDUCTOR CORPORATION   (United States)

^d FLORIDA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BILAYERS; NANODOTS; PINNING STRUCTURE; THICKNESS CURRENT;

ANISOTROPY; ARGON; COMPOSITE MATERIALS; CRITICAL CURRENTS; FILM THICKNESS; FOCUSED ION BEAMS;

MULTILAYER FILMS;

EID: 34547674762     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2767772     Document Type: Article

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