Microchannel formation in fused silica during ArF excimer laser irradiation

Physics and Chemistry of Glasses: European Journal of Glass Science and Technology Part B

Volumn 48, Issue 3, 2007, Pages 107-112

  Burkert, A ^a   Triebel, W ^a   Natura, U ^b   Martin, R ^b  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b Schott Lithotec AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34547654371     PISSN: 00319090     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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