메뉴 건너뛰기




Volumn 37, Issue 4, 2006, Pages 1947-1950

A 14.1 inch AMOLED display using highly stable PECVD based microcrystalline silicon TFT backplane

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; COST EFFECTIVENESS; MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILM TRANSISTORS; THIN FILMS; THRESHOLD VOLTAGE;

EID: 34547591575     PISSN: 0097966X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (7)

References (9)
  • 2
    • 34547561430 scopus 로고    scopus 로고
    • P. Roca i Cabarrocas, S. Kasouit, B. Kalache, R. Vanderhaghen, Y. Bonnassieux, M. Elyaakoubi, I. French. Microcrystalline silicon: An emerging material for stable thin film transistors Society of Information Display 2003, 34, Issue 1, pp. 1096
    • P. Roca i Cabarrocas, S. Kasouit, B. Kalache, R. Vanderhaghen, Y. Bonnassieux, M. Elyaakoubi, I. French. "Microcrystalline silicon: An emerging material for stable thin film transistors" Society of Information Display 2003, Volume 34, Issue 1, pp. 1096
  • 3
    • 0042388014 scopus 로고    scopus 로고
    • Investigation of grain boundary control in the drain junction on laser-crystalized poly-Si thin film transistors
    • Jul
    • T. F. Chen, C. F. Yeh, and J. C. Lou, "Investigation of grain boundary control in the drain junction on laser-crystalized poly-Si thin film transistors," IEEE Electron Device Lett., vol. 24, no. 7, pp. 457-459, Jul. 2003
    • (2003) IEEE Electron Device Lett , vol.24 , Issue.7 , pp. 457-459
    • Chen, T.F.1    Yeh, C.F.2    Lou, J.C.3
  • 4
    • 0142198864 scopus 로고    scopus 로고
    • Nanocrystalline silicon thin film transistors
    • August
    • I.C Cheng, S.Wagner, "Nanocrystalline silicon thin film transistors" IEEE Proc-Circuits Devices Syst., Vol.150, No.4, August 2003
    • (2003) IEEE Proc-Circuits Devices Syst , vol.150 , Issue.4
    • Cheng, I.C.1    Wagner, S.2
  • 5
    • 20844453706 scopus 로고    scopus 로고
    • High-mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition
    • Czang-Ho Lee, Andrei Sazonov, and Arokia Nathan, "High-mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition" Appl. Phys. Lett. 86, 222106 (2005)
    • (2005) Appl. Phys. Lett , vol.86 , pp. 222106
    • Lee, C.1    Sazonov, A.2    Nathan, A.3
  • 7
    • 0242581692 scopus 로고    scopus 로고
    • Microcrystalline silicon thin films grown by PECVD. Growth Mechanisms and Grain Size Control
    • P. Roca i Cabarrocas, A.F.I Morral, B. Kalache, S.Kasouit "Microcrystalline silicon thin films grown by PECVD. Growth Mechanisms and Grain Size Control, Solid State Phenomena Vol. 93 (2003) pp. 257
    • (2003) Solid State Phenomena , vol.93 , pp. 257
    • Roca i Cabarrocas, P.1    Morral, A.F.I.2    Kalache, B.3    Kasouit, S.4
  • 9
    • 34547582977 scopus 로고    scopus 로고
    • A.. Saafir, Kyuha Chung et al., A 14.1 inch WXGA solution processed OLED display with a-Si TFT, Society of Information Display 2005 Digest, pp968.
    • A.. Saafir, Kyuha Chung et al., "A 14.1 inch WXGA solution processed OLED display with a-Si TFT", Society of Information Display 2005 Digest, pp968.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.