Electrocoagulation of chemical mechanical polishing wastewater

Desalination

Volumn 214, Issue 1-3, 2007, Pages 31-37

  Drouiche, N ^a   Ghaffour, N ^b   Lounici, H ^c   Mameri, M ^c  

^a L'Unite de Developpement de la Technologie du Silicium   (Algeria)

^b Middle East Desalination Research Center   (Oman)

^c ECOLE NATIONALE POLYTECHNIQUE   (Algeria)

Author keywords

Chemical mechanical polishing wastewater; Electrocoagulation; Wafer

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CHEMICAL OXYGEN DEMAND; COAGULATION; COLOR; DISCHARGE (FLUID MECHANICS); ELECTROLYTIC POLISHING; FLUORINE COMPOUNDS; SULFUR COMPOUNDS;

ELECTROCOAGULATION; NEPHELOMETRIC TURBIDITY UNIT; PHOTOVOLTAIC WAFERS;

WASTEWATER TREATMENT;

CHEMICAL MECHANICAL POLISHING; CHEMICAL OXYGEN DEMAND; COAGULATION; COLOR; DISCHARGE (FLUID MECHANICS); ELECTROLYTIC POLISHING; FLUORINE COMPOUNDS; SULFUR COMPOUNDS; WASTEWATER TREATMENT;

CHEMICAL OXYGEN DEMAND; COAGULATION; WASTE TREATMENT;

EID: 34547558357     PISSN: 00119164     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.desal.2006.11.009     Document Type: Article

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