-
2
-
-
0023456110
-
-
Eliasson, B.; Hirth, M.; Kogelschatz, U. Journal of Physics D, Applied Physics 1987, 20, 1421-1437.
-
(1987)
Journal of Physics D, Applied Physics
, vol.20
, pp. 1421-1437
-
-
Eliasson, B.1
Hirth, M.2
Kogelschatz, U.3
-
4
-
-
0000046895
-
-
Kogelschatz, U.; Eliasson, B.; Hirth, M. Ozone Science and Engineering 1987, 9, 367-377.
-
(1987)
Ozone Science and Engineering
, vol.9
, pp. 367-377
-
-
Kogelschatz, U.1
Eliasson, B.2
Hirth, M.3
-
6
-
-
10444273945
-
Japanese Journal of Applied Physics
-
9B
-
Teranishi, K.; Suzuki, S.; Itoh, H. Japanese Journal of Applied Physics 2005, 43(9B), 6733-6739.
-
(2005)
, vol.43
, pp. 6733-6739
-
-
Teranishi, K.1
Suzuki, S.2
Itoh, H.3
-
7
-
-
0023843904
-
-
Masuda, S.; Kensuke, A.; Kuroda, M.; Awatsu, Y.; Shibuya, Y. IEEE Transactions on Industry Applications 1988, 24(2), 223-231.
-
(1988)
IEEE Transactions on Industry Applications
, vol.24
, Issue.2
, pp. 223-231
-
-
Masuda, S.1
Kensuke, A.2
Kuroda, M.3
Awatsu, Y.4
Shibuya, Y.5
-
8
-
-
9144258196
-
-
9A
-
Yamatake, A.; Yasuoka, K.; Ishii, S. Japanese Journal of Applied Physics 2004, 43(9A), 6381-6384.
-
(2004)
Japanese Journal of Applied Physics
, vol.43
, pp. 6381-6384
-
-
Yamatake, A.1
Yasuoka, K.2
Ishii, S.3
-
9
-
-
34547523601
-
-
Chalmers, I.; Zanella, L.; MacGregor, S. J.; Wray, I. A. IEE Colloquium Digest 1994, 229, 1-4.
-
Chalmers, I.; Zanella, L.; MacGregor, S. J.; Wray, I. A. IEE Colloquium Digest 1994, 229, 1-4.
-
-
-
-
10
-
-
0033751215
-
-
Samaranayake, W.J.M.; Miyahara, Y.; Namihira, T.; Katsuki, S.; Sakugawa, T.; Hackam, R.; Akiyama, H. IEEE Transactions on Dielectrics and Electrical Insulation 2000, 7(1), 254-260.
-
(2000)
IEEE Transactions on Dielectrics and Electrical Insulation
, vol.7
, Issue.1
, pp. 254-260
-
-
Samaranayake, W.J.M.1
Miyahara, Y.2
Namihira, T.3
Katsuki, S.4
Sakugawa, T.5
Hackam, R.6
Akiyama, H.7
-
11
-
-
0034476537
-
-
Samaranayake, W.J.M.; Miyahara, Y.; Namihira, T.; Katsuki, S.; Hackam, R.; Akiyama, H. IEEE Transaction on Dielectric and Electrical Insulation 2000, 7(6), 849-854.
-
(2000)
IEEE Transaction on Dielectric and Electrical Insulation
, vol.7
, Issue.6
, pp. 849-854
-
-
Samaranayake, W.J.M.1
Miyahara, Y.2
Namihira, T.3
Katsuki, S.4
Hackam, R.5
Akiyama, H.6
-
12
-
-
0030314772
-
-
Mizoguchi, H.; Ito, N.; Nakarai, H.; Kobayashi, Y.; Itakura, Y.; Komori, H.; Wakabayashi, O.; Aruga, T.; Sakugawa, T.; Koganezawa, T. The International Society for Optical Engineering-SPIE 1996, 2726, 831-840.
-
(1996)
The International Society for Optical Engineering-SPIE
, vol.2726
, pp. 831-840
-
-
Mizoguchi, H.1
Ito, N.2
Nakarai, H.3
Kobayashi, Y.4
Itakura, Y.5
Komori, H.6
Wakabayashi, O.7
Aruga, T.8
Sakugawa, T.9
Koganezawa, T.10
-
13
-
-
0027388059
-
-
Yoshino, K.; Esmond, J.R.; Freeman, D.E.; Parkinson, W.H. Journal of Geophysical Research 1993, 98(D3), 5205-5211.
-
(1993)
Journal of Geophysical Research
, vol.98
, Issue.D3
, pp. 5205-5211
-
-
Yoshino, K.1
Esmond, J.R.2
Freeman, D.E.3
Parkinson, W.H.4
-
14
-
-
0034171729
-
-
Namihira, T.; Tsukamoto, S.; Wang, D.; Katsuki, S.; Hackam, R.; Akiyamma, H.; Uchida, Y.; Koike, M. IEEE Transactions on Plasma Science 2000, 28(2), 434-442.
-
(2000)
IEEE Transactions on Plasma Science
, vol.28
, Issue.2
, pp. 434-442
-
-
Namihira, T.1
Tsukamoto, S.2
Wang, D.3
Katsuki, S.4
Hackam, R.5
Akiyamma, H.6
Uchida, Y.7
Koike, M.8
-
15
-
-
4644268559
-
-
Toyofuku, M.; Ohtsu, Y.; Fujita, H. High ozone generation with a high-dielectric-constant material 2004, 43(7A), 4368-4372.
-
Toyofuku, M.; Ohtsu, Y.; Fujita, H. "High ozone generation with a high-dielectric-constant material" 2004, 43(7A), 4368-4372.
-
-
-
-
16
-
-
23044458472
-
-
Stryczewska, H.; Ebihara, K.; Takayama, M.; Gyoutoku, Y.; Tachibana, M. Plasma Processes and Polymers 2005, 2, 238-245.
-
(2005)
Plasma Processes and Polymers
, vol.2
, pp. 238-245
-
-
Stryczewska, H.1
Ebihara, K.2
Takayama, M.3
Gyoutoku, Y.4
Tachibana, M.5
-
17
-
-
33645242221
-
-
Takayama, M.; Ebihara, K.; Stryczewska, H.; Ikegami, T.; Gyoutoku, Y.; Kubo, K.; Tachibana, M. Thin Solid Films 2006, 506-507, 396-399.
-
(2006)
Thin Solid Films
, vol.506-507
, pp. 396-399
-
-
Takayama, M.1
Ebihara, K.2
Stryczewska, H.3
Ikegami, T.4
Gyoutoku, Y.5
Kubo, K.6
Tachibana, M.7
-
20
-
-
0037262445
-
-
Zhang, Z.; Bai, X.; Bai, M.; Yang, B.; Zhou, X. Plasma Chemistry and Plasma Processing 2003, 23(3), 559-568.
-
(2003)
Plasma Chemistry and Plasma Processing
, vol.23
, Issue.3
, pp. 559-568
-
-
Zhang, Z.1
Bai, X.2
Bai, M.3
Yang, B.4
Zhou, X.5
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