Fabrication and microstructural change of PMN-PT thin films on Si substrates by PLD with mask and double-pulse laser excitation

Key Engineering Materials

Volumn 350, Issue , 2007, Pages 111-114

  Hayashi, Shogo ^a   Wakiya, Naoki ^a   Kiguchi, Takanori ^a   Tanaka, Junzo ^a   Shinozaki, Kazuo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Double pulse laser excitation; Droplet; Mask; PLD; PMN PT; Thin film

Indexed keywords

EXCIMER LASERS; FABRICATION; LASER EXCITATION; MICROSTRUCTURE; SILICON; SUBSTRATES; SURFACE ROUGHNESS;

DEPOSITION RATE; DOUBLE-PULSE EXCITATION; PULSE LASER EXCITATION; SMOOTHER SURFACES;

EPITAXIAL FILMS;

EID: 34547495465     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-449-9.111     Document Type: Conference Paper

References (4)

1. N. Nemoto et al. Key Engineering Materials, v 301, Electroceramics in Japan VIII, p. 265 (2006).
2. K. Shinozaki et al., Jpn. J. Appl. Phys., submitted.
3. D. N. Stratis et al, Appl. Spectrosc, 54, 1270 (2000).
4. Laser Ablation and Applications, Corona Publishing. Co. Ltd, p. 105(1999).