ATR-FTIR and nanoindentation measurements of PMDA-ODA polyimide film under different curing temperature

Materials Transactions

Volumn 48, Issue 6, 2007, Pages 1554-1557

  Lee, Shih Chin ^a   Tai, Fong Cheng ^a   Wei, Che Hung ^b   Yu, Jui I ^c  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b TATUNG UNIVERSITY   (Taiwan)

^c NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

ATR FTIR (attenuated total reflectance Fourier transform infrared spectrometer); Curing temperature; Micro hardness; Nano hardness; Nanoelastic modulus

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROHARDNESS; NANOHARDNESS; NANOINDENTATION; POLYIMIDES; REFLECTION;

ATR-FTIR APPARATUS; ATTENUATED TOTAL REFLECTANCE; CURING TEMPERATURE; NANOELASTIC MODULUS;

POLYMER FILMS;

EID: 34547395925     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.MER2007045     Document Type: Article

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