Microarea analysis of iron and phosphorus by resonance photoionization sputtered neutral mass spectrometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 751-757

  Shichi, H ^a   Osabe, S ^a   Sugaya, M ^a   Kanehori, K ^b   Kakibayashi, H ^b   Mitsui, Y ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DYE LASERS; LASER BEAMS; MASS SPECTROMETRY; PHOSPHORUS; PHOTOIONIZATION; RESONANCE; SILICON WAFERS;

MICROAREA ANALYSIS; RESONANCE IONIZATION; SPUTTERED NEUTRAL MASS SPECTROMETRY (SNMS);

IRON;

EID: 34547352127     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2746048     Document Type: Article

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