Nanolayer patterning based on surface modification with extreme ultraviolet light

Advanced Materials

Volumn 19, Issue 10, 2007, Pages 1321-1324

  Moon, Sangwoon ^a   Jeon, Cheolho ^b   Hwang, Han Na ^a   Hwang, Chan Cuk ^a   Song, Hajin ^a   Shin, Hyun Joon ^a   Chung, Sukmin ^a   Park, Chong Yun ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

HEATING; PHOTONS; SILICON WAFERS; SURFACE TREATMENT; SYNCHROTRON RADIATION; SYNTHESIS (CHEMICAL); THICKNESS MEASUREMENT; WAVELENGTH;

EXPERIMENTAL CHAMBER; PATTERNING; PHOTON FLUX; ULTRAVIOLET LIGHT;

NANOSTRUCTURED MATERIALS;

EID: 34547350821     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200602166     Document Type: Article

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