The influence of the thickness of TiO2 seeding layer on structural and electrical properties of Bi3.15Nd 0.85Ti3O12 thin films

Journal of Physics D: Applied Physics

Volumn 40, Issue 12, 2007, Pages 3788-3792

  Li, Jia ^a   Yu, Jun ^a   Peng, Gang ^a   Wang, Yunbo ^a   Zhou, Wenli ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; FILM THICKNESS; MOLECULAR STRUCTURE; SOL-GEL PROCESS; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

LAYER THICKNESSES; SEEDING LAYER THICKNESSES; SURFACE MICROGRAPHS;

THIN FILMS;

EID: 34547276060     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/12/034     Document Type: Article

References (14)

1. Park B H, Kang B S, Bu S D, Noh T W, Lee J and Jo M 1999 Nature 401 681
2. Lv L P, Zhang S T and Wang J 2005 J. Phys. D: Appl. Phys. 38 1355
3. Li J H, Qiao Y, Liu X L and Nie C J 2004 Appl. Phys. Lett. 85 3193
4. Zhang S T, Zhang X J and Cheng H W 2003 Appl. Phys. Lett. 83 4378
5. Lee H N, Hesse D and Zakharov N 2002 Science 296 2006
6. Garg A, Snedden A and Lightfoot P 2004 J. Appl. Phys. 96 3408
7. Bouregba R, Poullain G and Vilquin B 2000 Mater. Res. Bull. 35 1381
8. Aoki K, Fukuda Y and Numata K 1995 Japan. J. Appl. Phys. 34 192
9. Hase T, Sakuma T, Amanuma K and Mori T 1995 Integr. Ferroelectr. 8 89
10. Kim S T, Kim H H, Lee M Y and Lee W J 1997 Japan. J. Appl. Phys. 36 294
11. Abe K, Tomita H, Toyoda H and Imai M 1991 Japan. J. Appl. Phys. 30 2152
12. Sreenivas K, Reaney I, Maeder T and Setter N 1994 J. Appl. Phys. 75 232
13. Simoes A Z, Pianno R F C, Ries A and Varela A 2006 J. Appl. Phys. 100 084106
14. Muralt P, Maeder T and Sagalowicz L 1998 J. Appl. Phys. 83 3835