Supersonic cluster beam deposition of nanostructured thin films with uniform thickness via continuously graded exposure control

Review of Scientific Instruments

Volumn 78, Issue 6, 2007, Pages

  Chiappini, C ^a   Piseri, P ^a   Vinati, S ^b   Milani, P ^a  

^a UNIVERSITY OF MILAN   (Italy)

^b Via Franco Russoli 3   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

MICROFABRICATION; SUBSTRATES; SUPERSONIC FLOW; TESTING; THIN FILMS;

CLUSTER BEAM DEPOSITION; GRADED EXPOSURE CONTROL; LATERAL RESOLUTION; STENCIL MASKS; SUPERSONIC EXPANSIONS;

NANOSTRUCTURED MATERIALS;

NANOMATERIAL; TITANIUM; TITANIUM DIOXIDE;

ACOUSTICS; ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; GAS; INSTRUMENTATION; METHODOLOGY; NANOTECHNOLOGY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTY; ULTRASTRUCTURE;

ACOUSTICS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; GASES; MEMBRANES, ARTIFICIAL; NANOSTRUCTURES; NANOTECHNOLOGY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTIES; TITANIUM;

EID: 34547256456     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2746824     Document Type: Article

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