Effects of ion energy control on production of nitrogen-C60 compounds by ion implantation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8340-8343

  Abe, Shigeyuki ^a   Sato, Genta ^b   Kaneko, Toshiro ^a   Hirata, Takamichi ^c   Hatakeyama, Rikizo ^a   Yokoo, Kuniyoshi ^d   Ono, Shoichi ^d   Omote, Kenji ^d   Kasama, Yasuhiko ^d  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c TOKYO CITY UNIVERSITY   (Japan)

^d Ideal Star Corporation   (Japan)

Author keywords

C59N; ECR; ESR; Fullerene; HPLC; N@C60; Nitrogen; Plasma; TOF

Indexed keywords

FULLERENES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; ION IMPLANTATION; SUBSTRATES;

ELECTRON CYCLOTRON RESONANCE PLASMA; NITROGEN IONS;

POWER CONTROL;

EID: 34547209245     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8340     Document Type: Article

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