Low pressure RF capacitively coupled plasma reactor for modification of seeds, polymers and textile fabrics

Materials Science Forum

Volumn 494, Issue , 2005, Pages 291-296

  Puac N ^a   Petrovic Z Lj ^a   Radetic M ^a   Djordjevic A ^b  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b School of Electrical Engineering   (Serbia)

Author keywords

CCP RF discharge; Plasma treatment; Polymers; Seeds; Wool

Indexed keywords

CHEMICAL REACTORS; PRESSURE EFFECTS; SEED; SURFACE TREATMENT; WETTING;

CCP RF DISCHARGE; FELTING SHRINKAGE;

WOOL;

EID: 34547182046     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-971-7.291     Document Type: Conference Paper

References (7)

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7. S. Živković, N. Puač, Z. Giba, D. Grubišić and Z.Lj. Petrović, Seed Science and Technology, (to be published 2004).