Analysis for crystal structure of Bi (Fe,Sc) O3 thin films and their electrical properties

Applied Physics Letters

Volumn 91, Issue 2, 2007, Pages

  Yasui, Shintaro ^a,b   Uchida, Hiroshi ^b   Nakaki, Hiroshi ^a   Nishida, Ken ^c   Funakubo, Hiroshi ^a   Koda, Seiichiro ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b SOPHIA UNIVERSITY   (Japan)

^c KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; HYSTERESIS LOOPS; LEAKAGE CURRENTS; PEROVSKITE; REMANENCE;

CHEMICAL SOLUTION DEPOSITION; RAMAN MEASUREMENT; SELECTIVE REPLACEMENT;

THIN FILMS;

EID: 34547175208     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2756356     Document Type: Article

References (8)

1. J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299, 1719 (2003).
2. K. Y. Yun, D. Ricinschi, T. Kanashima, M. Noda, and M. Okuyama, Jpn. J. Appl. Phys., Part 2 43, L647 (2004).
3. W. Eerenstein, F. D. Morrison, J. Dho, M. G. Blamire, J. F. Scott, and N. D. Mathur, Science 307, 1203a (2005).
4. H. Uchida, R. Ueno, H. Funakubo, and S. Koda, J. Appl. Phys. 100, 014106 (2006).
5. D. I. Woodward, I. M. Reaney, R. E. Eitel, and C. A. Randall, J. Appl. Phys. 94, 3313 (2003).
6. M. Okada, T. Yoshimura, A. Ashida, and N. Fujimura, Jpn. J. Appl. Phys., Part 1 43, 6609 (2004).
7. P. Baettig, C. Ederer, and N. A. Spaldin, Phys. Rev. B 72, 214105 (2005).
8. A. A. Belik, S. Iikubo, K. Kodama, N. Igawa, S. Shamoto, M. Maie, T. Nagai, Y. Matsui, S. Yu. Stefanovich, B. I. Lazoryak, and E. Takayama-Muromachi, J. Am. Chem. Soc. 128, 706 (2006).