Modeling of intra-die process variations for accurate analysis and optimization of nano-scale circuits

Proceedings - Design Automation Conference

Volumn , Issue , 2006, Pages 791-796

  Bhardwaj, Sarvesh ^a   Vrudhula, Sarma ^a   Ghanta, Praveen ^a   Cao, Yu ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

Correlations; Intra die; Karhunen Loeve; Leakage; Process variations; Statistical

Indexed keywords

ALGORITHMS; CONSTRAINED OPTIMIZATION; LEAKAGE CURRENTS; PRINCIPAL COMPONENT ANALYSIS; RANDOM PROCESSES; SEMICONDUCTOR DEVICE MANUFACTURE;

KARHUNEN-LOEVE EXPANSION; LEAKAGE ANALYSIS; PROBABILISTIC CONSTRAINTS; PROCESS VARIATIONS;

NANOELECTRONICS;

EID: 34547152233     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1146909.1147109     Document Type: Conference Paper

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