Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes

Journal of Hazardous Materials

Volumn 147, Issue 1-2, 2007, Pages 307-312

  Shang, Neng Chou ^a   Chen, Yi Hung ^b   Ma, Hwong Wen ^a   Lee, Chi Wei ^a   Chang, Cheng Hsin ^c   Yu, Yue Hwa ^a   Lee, Chien Hsien ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^c TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Methyl methacrylate; Ozonation; Ozone; Semiconductor; UV radiation

Indexed keywords

METHYL METHACRYLATE; OZONATED INTERMEDIATES; REMOVAL EFFICIENCY;

ACETIC ACID; OZONE; OZONIZATION; ULTRAVIOLET RADIATION;

WASTEWATER TREATMENT;

ACETIC ACID; FORMIC ACID; METHACRYLIC ACID METHYL ESTER; OZONE;

ACETIC ACID; OZONE; OZONIZATION; ULTRAVIOLET RADIATION; WASTEWATER TREATMENT;

ACETIC ACID; EXPERIMENTAL STUDY; FORMIC ACID; OXIDATION; OZONE; PH; REMOVAL EXPERIMENT; RESIN; ULTRAVIOLET RADIATION; WASTEWATER;

ARTICLE; CONCENTRATION RESPONSE; DECOMPOSITION; MINERALIZATION; OXIDATION; OZONATION; RADIATION DOSE; REACTION ANALYSIS; REACTION TIME; SEMICONDUCTOR; ULTRAVIOLET IRRADIATION; ULTRAVIOLET RADIATION; WASTE WATER MANAGEMENT;

ACETIC ACID; FORMIC ACIDS; INDUSTRIAL WASTE; METHYLMETHACRYLATE; OXIDATION-REDUCTION; OZONE; PHOTOLYSIS; SEMICONDUCTORS; ULTRAVIOLET RAYS;

EID: 34447635495     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2007.01.004     Document Type: Article

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