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In order to perform retro Diels-Alder reaction, ITO/CP was heated to 210°C under vacuum to remove oxygen and/or water. This thermal reaction can also be performed under nitrogen atmosphere without vacuum treatment. Compared to traditional vacuum deposition technique, the vacuum treatment in our method is simpler and our film-preparation method has the advantage of cost-effective, large-area, high-device formation.
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In order to perform retro Diels-Alder reaction, ITO/CP was heated to 210°C under vacuum to remove oxygen and/or water. This thermal reaction can also be performed under nitrogen atmosphere without vacuum treatment. Compared to traditional vacuum deposition technique, the vacuum treatment in our method is simpler and our film-preparation method has the advantage of cost-effective, large-area, high-volume device formation.
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