Erratum to "Analysis of vertical cracking phenomena in tensile-strained epitaxial film on a substrate: Part I. Mathematical formulation" [International Journal of Solids and Structures 43 (2006) 3401-3413] (DOI:10.1016/j.ijsolstr.2005.05.002)

International Journal of Solids and Structures

Volumn 44, Issue 17, 2007, Pages 5801-

  Lee, S ^a   Choi, S T ^b   Earmme, Y Y ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34447337259     PISSN: 00207683     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijsolstr.2007.04.027     Document Type: Erratum

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