Carbon nitride films of uniform thickness by inverse PLD

Applied Surface Science

Volumn 253, Issue 19, 2007, Pages 8197-8200

  Egerhazi, L ^a   Geretovszky, Zs ^a   Szorenyi T ^a  

^a UNIVERSITY OF SZEGED   (Hungary)

Author keywords

Ellipsometry; Homogenization; Rotation

Indexed keywords

CARBON NITRIDE; EXCIMER LASERS; FILM GROWTH; PRESSURE EFFECTS; PULSED LASER DEPOSITION; SILICON;

JOINTLY ROTATING; KRF EXCIMER; NITROGEN ATMOSPHERE; SILICON SUBSTRATE;

THICK FILMS;

EID: 34447333382     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.127     Document Type: Article

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