Control parameters in pattern formation upon femtosecond laser ablation

Applied Surface Science

Volumn 253, Issue 19, 2007, Pages 7932-7936

  Varlamova, Olga ^a   Costache, Florenta ^a   Ratzke, Markus ^a   Reif, Jürgen ^a  

^a BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

CaF 2; Electrical properties; Elliptical polarization; Femtosecond laser ablation; Self organized nano structures; Silicon

Indexed keywords

ELECTRIC PROPERTIES; LASER BEAMS; NANOSTRUCTURED MATERIALS; POLARIZATION; SURFACE CHARGE; ULTRASHORT PULSES;

ELLIPTICAL POLARIZATION; FEMTOSECOND LASER ABLATION; IRRADIATION DOSE; SELF ORGANIZED NANOSTRUCTURES;

LASER ABLATION;

EID: 34447331296     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.067     Document Type: Article

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