High-intensity negative ion sources for material science applications

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 261, Issue 1-2 SPEC. ISS., 2007, Pages 1032-1035

  Ishikawa, Junzo ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Ion beam deposition; Ion implantation; Ion source; Negative ion

Indexed keywords

ION BEAM DEPOSITION; MATERIAL SCIENCE APPLICATIONS; MICROAMPERES; PARTICLE EMISSION;

ELECTRIC INSULATORS; ION BEAMS; ION IMPLANTATION; NEGATIVE IONS; QUANTUM THEORY; SPUTTERING;

ION SOURCES;

EID: 34447290039     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.04.141     Document Type: Article

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