A Simple Photomask with Photoresist Mask Layer for Ultraviolet-Photolithography and Its Application for Selectively Photochemical Surface Modification of Polymers

Chinese Journal of Analytical Chemistry

Volumn 35, Issue 5, 2007, Pages 623-627

  Yong, Kong ^a   Heng Wu, Chen ^a   Xiao, Yun ^a   Zhen Xia, Hao ^a   Zhao Lun, Fang ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

AZ Photoresist; Gold microelectrode; Photochemical modification; Photomask; Polycarbonate electrophoresis chip

Indexed keywords

EID: 34347258858     PISSN: 2533820     EISSN: 18722040     Source Type: Journal    
DOI: 10.1016/S1872-2040(07)60049-8     Document Type: Article

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