Investigating the development of digital patterns for customized apparel

International Journal of Clothing Science and Technology

Volumn 19, Issue 3-4, 2007, Pages 167-177

  Yang, Yunchu ^a   Zhang, Weiyuan ^a   Shan, Cong ^b  

^a DONGHUA UNIVERSITY   (China)

^b SHANGHAI UNIVERSITY OF ENGINEERING SCIENCE   (China)

Author keywords

Artificial intelligence; Clothing; Customization; Flatness measurement; Parametric measures

Indexed keywords

APPAREL MASS CUSTOMIZATION; CLOTHING; CUSTOMIZATION; DESIGN/METHODOLOGY/APPROACH; DEVELOPMENT AND APPLICATIONS; FLATNESS MEASUREMENTS; GRAPHICAL STRUCTURES; PARAMETRIC MEASURES;

ARTIFICIAL INTELLIGENCE; GRADING; THREE DIMENSIONAL;

COMPUTER AIDED DESIGN;

APPAREL FABRIC; COMPUTER AIDED DESIGN; CUSTOMIZATION; DATABASE; DIGITAL METHOD; PATTERN (CONFIGURATION); TECHNOLOGY;

EID: 34250745699     PISSN: 09556222     EISSN: 17585953     Source Type: Journal    
DOI: 10.1108/09556220710741632     Document Type: Review

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