45NM node categorized via chain resistance and image by Optical Beam Induced Resistance Changes (OBIRCH) method

IEEE International Reliability Physics Symposium Proceedings

Volumn , Issue , 2006, Pages 643-644

  Matsubara, Yoshihisa ^a   Watanabe, Tadayoshi ^a  

^a Semiconductor Leading Edge Technologies   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHAIN INTERCONNECTS; CHAIN RESISTANCE;

FAILURE MODES; FEATURE EXTRACTION; IMAGE RECONSTRUCTION; IMAGING SYSTEMS;

ELECTRIC RESISTANCE;

EID: 34250722652     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2006.251303     Document Type: Conference Paper

References (1)

1. K. Nikawa and S.Tozaki, ISFA 1993, pp.303-310, 1993.