Electromagnetic shielding fabrics with magnetron sputtered copper coating

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology

Volumn 27, Issue 3, 2007, Pages 264-268

  Chen, Wenxing ^a   Du, Lijuan ^a   Yao, Yuyuan ^a   Lu, Shenshui ^a  

^a ZHEJIANG SCI TECH UNIVERSITY   (China)

Author keywords

Atomic force microscopy; DC magnetron sputtering; Electromagnetic shield performance; Surface resistance

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION RATES; ELECTROMAGNETIC SHIELDING; FILMS; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; SURFACE RESISTANCE;

COPPER FILMS; DC MAGNETRON SPUTTERING; ELECTROMAGNETIC SHIELD PERFORMANCE;

COPPER;

EID: 34250369647     PISSN: 16727126     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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