Damage threshold improvement of fused silica chip by CO2 laser pretreatment

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 34, Issue 5, 2007, Pages 723-727

  Huang, Jin ^a   Lu, Hai Bing ^a   Ye, Lin ^a   Zhao, Song Nan ^a   Wang, Hai Jun ^a   Jiang, Xiao Dong ^a   Yuan, Xiao Dong ^a   Zheng, Wan Guo ^a  

^a RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

CO2 laser; Damage threshold; Fused silica chip; Laser technique; Pretreatment; Raster scanning

Indexed keywords

CARBON DIOXIDE LASERS; FUSED SILICA; HYDROFLUORIC ACID; POLISHING; TOPOGRAPHY; WAVEFRONTS;

DAMAGE THRESHOLD; FUSED SILICA CHIP; LASER TECHNIQUE; PRETREATMENT; RASTER SCANNING;

LASER APPLICATIONS;

EID: 34250355182     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. 2-Laser Polishing for Reduction of 351-nm Surface Damage Initiation in Fused Silica[M]. Laser Induced Damage in Optical Material, 2001. 1-2
2. 2 Laser Treatment for Mitigation of 3ω Damage Growth on Fused Silica[C]. Boulder Damage Symposium on Optical Material, 2001. 1-3
3. Chen Fei, Meng Shaoxian. Damage mechanism of optical material[J]. Progress in Physics, 1998, 18(2): 198-206
4. 2 Laser Mitigation of Damage Growth in Fused Silica[C]. Annual Symposium on Optical Material for High Power Laser, 2002. 16-18
5. 2 Laser Mitigation of Damage Growth in Fused Silica[C]. Annual Symposium on Optical Material for High Power Laser, 2003. 22-24
6. Yang Jinxin, Zhuang Yifei, Gao Qi et al.. Platform for laser induced damage threshold test of optical elements[J]. Chinese J. Lasers, 2003, 31(Suppl.): 430-433