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Volumn , Issue , 2006, Pages 382-385
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SAW substrate for duplexer with excellent temperature characteristics and large reflection coefficient realized by using flattened Si02 film and thick heavy metal film
a a a a a a a a |
Author keywords
Cu electrode; Duplexer; Excellent TCF; Flattened SiO2; LiTaO3
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Indexed keywords
LITHIUM COMPOUNDS;
METALLIC FILMS;
MULTIPLEXING EQUIPMENT;
REFLECTION;
SHEET RESISTANCE;
SILICA;
COPPER ELECTRODES;
DUPLEXERS;
LITHIUM TITANATE;
TEMPERATURE COEFFICIENT OF FREQUENCY (TCP);
SUBSTRATES;
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EID: 34250318933
PISSN: 0149645X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/MWSYM.2006.249550 Document Type: Conference Paper |
Times cited : (20)
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References (8)
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