Resistance of ion track based electronic structures to high voltage and radiation

Journal of Physics D: Applied Physics

Volumn 40, Issue 10, 2007, Pages 3212-3218

  Fink, D ^a   Chandra, A ^a,b   Fahrner, W R ^c   Hoppe, K ^d   Opitz Coutureau, J ^a   Bundesmann, J ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b UNIVERSITY OF DELHI   (India)

^c UNIVERSITY OF HAGEN   (Germany)

^d South Westfalia University of Applied Sciences   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; RADIATION EFFECTS; REACTIVE ION ETCHING; SEMICONDUCTOR MATERIALS; SILICA;

ELECTRIC PULSES; ELECTRONIC MATERIALS; HIGH ENERGY RADIATION;

ELECTRONIC STRUCTURE;

EID: 34250195036     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/10/027     Document Type: Article

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