Comparison of structural and electrical properties of PMN-PT films deposited on Si with different bottom electrodes

Journal of Crystal Growth

Volumn 305, Issue 1, 2007, Pages 137-143

  Detalle, M ^a   Wang, G ^a   Remiens D ^a   Ruterana, P ^b   Roussel, P ^c   Dkhil, B ^d  

^a UNIVERSITÉ DE VALENCIENNES   (France)

^b UNIVERSITÉ DE CAEN   (France)

^c UNITÉ DE CATALYSE ET DE CHIMIE DU SOLIDE   (France)

^d LABORATOIRE STRUCTURES   (France)

Author keywords

A1. Dielectric properties; A1. Interfacial capacitance; A3. Physical vapor deposition processes; B1. TiOx Pt and LNO bottom electrodes; B2. PMN PT films

Indexed keywords

BUFFER LAYERS; CAPACITANCE; DIELECTRIC PROPERTIES; ELECTRODES; PHYSICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; SUBSTRATES;

BOTTOM ELECTRODES; FILMS DEPOSITION; INTERFACIAL CAPACITANCE; SILICON SUBSTRATE;

POLYMER FILMS;

EID: 34249999725     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.04.020     Document Type: Article

References (19)

1. Park J.H., Kang D.H., and Yoon K.H. J. Am. Ceram. Soc. 82 (1999) 2116
2. Trolier-McKinstry S., Shepard J.F., Lacey J.L., Su T., and Zavala G. J. Fender. Ferroelectrics 381 (1998) 206
3. Huang Z., Sakuma K., and Whatmore R.W. J. Appl. Phys. 85 (1999) 7355
4. Shrout TR. Ultrason. Symp. 711 (1990)
5. Haertling G.H. J. Am. Ceram. Soc. 82 (1999) 797
6. Francis L.F., and Payne D.A. J. Am. Ceram. Soc. 74 12 (1991) 3000
7. Tantigate C., Lee J., and Safari A. Appl. Phys. Lett. 66 13 (1995) 1661
8. Du X.-H., Zheng J., Belegunda U., and Uchino K. Appl. Phys. Lett. 72 (1998) 2421
9. Hren P.D., Ron S.H., Al-Shareef H.N., Ameen M.S., Auciello O., and Kingon A.I. Integr. Ferroelectr. 2 (1992) 311
10. Kighelman Z Z., Damjanovic D D., and Setter N.J. Appl. Phys. 89 2 (2000) 1393
11. Ishikwa K., Sakura K., Fu D., and Yamada S. Jpn. J. Appl. Phys. Part1 37 (1998) 5128
12. Cattan E., Velu G., Jaber B., Rémiens D., and Thierry B. Appl. Phys. Lett. 70 (1997) 1718
13. Ren S.B., Ju C.J., Liu J.S., Shen H.M., and Wang Y.N. Phys. Rev. B54 (1996) 14337
14. Desu S.B., Peng CH C.H., Kammerdiner L., and Schuele P.J. Mater. Res. Soc. Symp. Proc. 200 (2000) 319
15. Randal C.A., Bhalla A.S., Shrout T.R., and Cross L.E.J. Mater. Res. 5 (1990) 829
16. Shirane G., and Pepinsky R. Phys. Rev. 92 (1953) 504
17. Vasant Kumar C.V.R., Sayer M., Pascual R., Amm D.T., Wu Z., and Swanton D.M. Appl. Phys. Lett. 58 (1991) 1161
18. Tagantsev A.K., Landivar M., Colla E., and Setter N. J. Appl. Phys. 78 4 (1995) 2623
19. Herdier R., Jenkins D., Dogheche E., and Remiens D. Rev. Sci. Instrum. 77 (2006) 093905