Secondary ion emission from Ti and Si targets induced by medium energy Ar+ ion bombardment - Experiment and computer simulation

Vacuum

Volumn 81, Issue 10, 2007, Pages 1145-1149

  Pyszniak, K ^a   Drozdziel A ^a   Turek, M ^a   Wojtowicz A ^a   Sielanko, J ^a  

^a MARIA CURIE SK ODOWSKA UNIVERSITY   (Poland)

Author keywords

Ion implantation; Ion solid interaction; Secondary ion mass spectroscopy; Sputtering

Indexed keywords

ARGON; COMPUTER SIMULATION; ELECTROSTATICS; ION BOMBARDMENT; POSITIVE IONS; SECONDARY ION MASS SPECTROMETRY; SILICON; SPUTTERING; TARGETS; TITANIUM;

ELECTROSTATIC ENERGY ANALYZERS; ION SOLID INTERACTION; SECONDARY ION ENERGY DISTRIBUTIONS; SECONDARY ION EXTRACTION SYSTEMS;

SECONDARY EMISSION;

EID: 34249930874     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.01.005     Document Type: Article

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