Low-temperature poly-Si TFT by excimer laser annealing

Materials Research Society Symposium Proceedings

Volumn 685, Issue , 2001, Pages 227-231

  Nishibe, Tohru ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; EXCIMER LASERS; GLASS; INTEGRATED CIRCUITS; POLYSILICON; SUBSTRATES;

DRIVER CIRCUITS; GATE INSULATORS; VALUE-ADDED DISPLAY;

THIN FILM TRANSISTORS;

EID: 34249909773     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-685-d6.1.1     Document Type: Conference Paper

References (4)

1. N. Ibaraki : SID99 Digest, p 172(1999)
2. T.Fujimura et al: AMLCD2001 to be published
3. M.Hiramatsu et al: to be published
4. A. Takami et al: AMLCD2000 Digest, p45 (2000)