Stress stability of poly-SiGe and various oxide films in humid environments

Materials Research Society Symposium Proceedings

Volumn 854, Issue , 2004, Pages 22-27

  Low, Carrie W ^a   Bircumshaw, Brian L ^a   Dorofeeva, Tatiana ^a   Solomon, Gelila ^a   King, Tsu Jae ^a   Howe, Roger T ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC HUMIDITY; MEMS; RESIDUAL STRESSES; SILICON COMPOUNDS; STRESS ANALYSIS; THIN FILMS;

POLY-SIGE; STONEY EQUATION; WAFER CURVATURE MEASUREMENT;

OXIDE FILMS;

EID: 34249904387     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-854-u3.3     Document Type: Conference Paper

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