Optical emission spectroscopy characterization of oxygen plasma during degradation of Escherichia coli

Journal of Applied Physics

Volumn 101, Issue 10, 2007, Pages

  Vujosevic D ^a   Mozetic M ^a   Cvelbar, U ^a   Krstulovic N ^b   Milosevic S ^b  

^a JO EF STEFAN INSTITUTE   (Slovenia)

^b INSTITUTE OF PHYSICS   (Croatia)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON MONOXIDE; DEGRADATION; ESCHERICHIA COLI; LANGMUIR PROBES; OPTICAL EMISSION SPECTROSCOPY; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; STERILIZATION (CLEANING);

BACTERIA DEGRADATION; GLOW DISCHARGE; OXYGEN PLASMA; PLASMA RADICALS;

PLASMA DENSITY;

EID: 34249876346     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2732693     Document Type: Article

References (31)

1. D. J. Wilson, N. P. Rhodes, and R. L. Williams, Biomaterials 24, 5069 (2003).
2. M. K. Gunde and M. Kunaver, Appl. Spectrosc. 57, 1266 (2003).
3. M. Mozetic, U. Cvelbar, M. K. Sunkara, and S. Vaddiraju, Adv. Mater. (Weinheim, Ger.) 17, 2138 (2005).
4. K. Ostrikov, Rev. Mod. Phys. 77, 489 (2005).
5. A. Vesel, M. Mozetic, A. Drenik, S. Milosevic, N. Krstulovic, M. Balat-Pichelin, I. Poberaj, and D. Babic, Plasma Chem. Plasma Process. 26, 577 (2006).
6. Z. Y. Wu, N. Xanthopoulos, F. Reymond, J. S. Rossier, and H. H. Girault, Electrophoresis 23, 782 (2002).
7. A. G. Whittaker, J. Hosp. Infect. 56, 37 (2004).
8. M. Nagatsu, F. Terashita, and Y. Koide, Jpn. J. Appl. Phys., Part 2 42, L856 (2003).
9. S. Villeger, S. Cousty, A. Ricard, and M. Sixou, J. Phys. D 36, L60 (2003).
10. S. Moreau, M. Moisan, M. Tabrizian, J. Barbeau, J. Pelletier, A. Ricard, and L. H. Yahia, J. Appl. Phys. 88, 1166 (2004).
11. S. Gomez, P. G. Steen, and W. G. Graham, Appl. Phys. Lett. 81, 19 (2002).
12. M. Mozetic, Vacuum 71, 237 (2003).
13. U. Cvelbar, S. Pejovnik, M. Mozetic, and A. Zalar, Appl. Surf. Sci. 210, 255 (2002).
14. U. Cvelbar, D. Vujosevic, Z. Vratnica, and M. Mozetic, J. Phys. D 39, 3487 (2006).
15. M. Klanjsek-Gunde, M. Kunaver, M. Mozetic, and M. Horvat, Powder Technol. 148, 64 (2004).
16. G. Cartry, X. Duten, and A. Rousseau, Plasma Sources Sci. Technol. 15, 476 (2006).
17. K. N. Ostrikov, S. Xu, and A. B. M. S. Azam, J. Vac. Sci. Technol. A 20, 251 (2002).
18. U. Cvelbar, N. Krstulovic, S. Milosevic, and M. Mozetic, Vacuum 81 (in press).
19. K. N. Ostrikov, M. Y. Yu, and H. Sugai, J. Appl. Phys. 86, 2425 (1999).
20. K. N. Ostrikov and M. Y. Yu, IEEE Trans. Plasma Sci. 26, 100 (1998).
21. U. Cvelbar, M. Klanjsek-Gunde, and M. Mozetic, IEEE Trans. Plasma Sci. 33, 236 (2005).
22. M. Moisan, J. Barbeau, M. C. Cervier, J. Pelletier, N. Philip, and B. Saoudi, Pure Appl. Chem. 74, 349 (2002).
23. M. Blank and R. Goodman, IEEE Trans. Plasma Sci. 30, 1497 (2002).
24. R. E. J. Sladek and E. Stoffels, J. Phys. D 38, 1716 (2005).
25. W. A. Rutala, M. F. Gergen, and D. J. Weber, Infect. Control Hosp. Epidemiol. 26, 393 (1998).
26. A. Drenik, U. Cvelbar, A. Vesel, and M. Mozetic, Inf. MIDEM, J. Microelectron. Compon. Mat., 35, 85 (2005).
27. L. Lefevre, T. Belmonte, and H. Michel, J. Appl. Phys. 87, 7497 (2000).
28. H. Singh, J. W. Coburn, and D. B. Graves, J. Appl. Phys. 88, 3748 (2000).
29. U. Cvelbar, M. Mozetic, and A. Ricard, IEEE Trans. Plasma Sci. 33, 834 (2005).
30. M. Mozetič, A. Vesel, U. Cvelbar, and A. Ricard, Plasma Chem. Plasma Process. 26, 103 (2006).
31. Z. L. Tsakadze, K. Ostrikov, J. D. Long, and S. Xu, Diamond Relat. Mater. 13, 1923 (2004).