Pr2 O3 on Si(001): A commensurate interfacial layer overgrown by silicate

Applied Physics Letters

Volumn 90, Issue 22, 2007, Pages

  Libralesso, L ^a   Lee, T L ^a   Zegenhagen, J ^a  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTALLINE MATERIALS; FILM THICKNESS; SILICON; ULTRAHIGH VACUUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAZING INCIDENTS; INTERFACIAL LAYERS; TRANSITION LAYERS;

PRASEODYMIUM COMPOUNDS;

EID: 34249868996     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2743945     Document Type: Article

References (20)

1. International Technology Roadmap for Semiconductors (2005), http://public.itrs.net.
2. A. Fissel, H. J. Osten, and E. Bugiel, J. Vac. Sci. Technol. B 21, 1765 (2003).
3. H. J. Osten, J. Dabrowski, H. J. Müssig, A. Fissel, and V. Zavodinski, Predictive Simulation of Semiconductor Processing, Springer Series in Materials Science, edited by, J. Dabrowski, and, E. Weber, (Springer, New York, 2004), Vol. 72, Chap. 7, pp. 259-293.
4. X. Guo, W. Braun, B. Jenichen, and K. Ploog, J. Cryst. Growth 290, 73 (2006).
5. H. J. Osten, J. P. Liu, E. Bugiel, H. J. Müssig, and P. Zaumseil, J. Cryst. Growth 235, 229 (2002).
6. H. J. Osten, E. Bugiel, and A. Fissel, Solid-State Electron. 47, 2161 (2003).
7. H. J. Müssig, J. Dabrowski, K. Ignatovich, J. P. Liu, V. Zavodinsky, and H. J. Osten, Surf. Sci. 504, 159 (2002).
8. T. Schroeder, T.-L. Lee, J. Zegenhagen, C. Wenger, P. Zaumseil, and H.-J. Müssig, Appl. Phys. Lett. 85, 1229 (2004).
9. A. Fissel, J. Dabrowski, and H. J. Osten, J. Appl. Phys. 91, 8986 (2002).
10. D. Schmeisser and H.-J. Müssig, Solid-State Electron. 47, 1607 (2003).
11. D. Schmeisser, H.-J. Müssig, and J. Dabrowski, Appl. Phys. Lett. 85, 88 (2004).
12. J. Dabrowski and V. Zavodinsky, in Proceedings of the NIC Symposium 2004, edited by, Dietrich Wolf, Gernot Münster, and, Manfred Kremer, (John von Neumann Institut für Computing, Jülich, Germany, 2003), Vol. 20, pp. 171-180.
13. J. Als-Nielsen, Topics in Current Physics (Springer, Berlin, 1986), Vol. 2, p. 181.
14. I. W. Hamley and J. S. Pedersen, J. Appl. Crystallogr. 27, 29 (1994).
15. P. Villars and L. Calvert, Pearson's Handbook of Crystallographic Data for Intermetallic Phases, 2nd ed., (ASM International, Materials Park, OH, 1991), Vol. 4, p. 4749.
16. J. Felsche, Struct. Bonding (Berlin) 13, 150 (1973).
17. R. Feidenhans'l, Surf. Sci. Rep. 10, 105 (1989).
18. A. Kotani and H. Ogasawara, J. Electron Spectrosc. Relat. Phenom. 60, 257 (1992).
19. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of the X-ray Photoelectron Spectroscopy, edited by, J. Chastain, (Perkin-Elmer Corporation, 1992), Vol. 1, pp. 45, 57, 144-145.
20. C. Dallera, L. Duó, L. Braicovich, G. Panaccione, G. Paolicelli, B. Cowie, and J. Zegenhagen, Appl. Phys. Lett. 85, 4532 (2004).