Proton beam writing of submicrometer structures at LIPSION

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 260, Issue 1, 2007, Pages 419-425

  Menzel, F ^a   Spemann, D ^a   Petriconi, S ^a   Lenzner, J ^a   Butz, T ^a  

^a UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

Electrochemical etching; Ni plating; Photo resist; Proton beam writing; Silicon

Indexed keywords

ASPECT RATIO; CURRENT DENSITY; ELECTROCHEMICAL ETCHING; ION BOMBARDMENT; NANOTECHNOLOGY; NICKEL PLATING;

BEAM SPOT FLUCTUATIONS; PLATING CURRENT DENSITY; PROTON BEAM WRITING (PBW);

ION BEAM LITHOGRAPHY;

EID: 34249865588     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.02.056     Document Type: Article

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